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Tractrix™ Spin Tool
Tractrix, stand-alone, automatic spin tool for 2” to 450mm substrates
The Tractrix™ tool is our top-of-the-line, spin track. If you process substrates from 2" to 450mm, need PC control and programmability, and require uniformity on a par with tier-1 systems, you've come to the right place. The Tractrix™ product not only encompasses all of the above, it fits into a very small footprint with an equally small price tag.
Applications
- Production - Typical Application
- R&D - Process chemical development, Advanced lithography development
- Special applications
- For g-line, i-line, DUV
- Substrates: silicon, compound semi (GaAs, others), glass
- Substrate shapes: round, square, rectangle
Benefits
- Precise, repeatable results
- Competitive cost
- Low maintenance
- EZ-Switch™ quick, easy substrate size conversion
- Sof-Touch™ wafer handling for efficient and smooth indexing, pick-and-place, positioning and transfer
Features
- Proprietary, single axis linear transfer arm
- Automated centering of 2 different substrates
- Requires far less maintenance than any other track system utilizing multi-axis robotic transfer
- Interfaces available for most chemical pumps - Cybor, IDI
- Combined coat and develop system
- Combined coat & develop system configuration for cost-savings
- Intuitive Windows-Xp based GUI - Login screens, Process program sheet
- For g-line, i-line, DUV
- Bake temperature 50-200⁰C standard - Uniformity at 90 ⁰C, 130 ⁰C, 200 ⁰C, Proximity vs. Contact
- Spin Speed – 10-6,000 RPMs – Acceleration curve
- Back up program retention (flash drive)
- Advanced mechanical positioning and control systems
Whether your process is g-line, i-line, DUV, or something completely unique, Spintrac Systems' Tractrix™ systems can be configured accordingly.
