SpinBall™ Single-wafer Spin Station
The SpinBall Spin Station is a small, manually loaded tool designed for the spin deposition of photoresists, developers, polymers and other materials common to integrated circuit photolithography. Built using the same proven technology of our production-grade Tractrix™ spin track, the SpinBall tool contains many of the same advanced components and automatic capabilities and is a low-cost alternative to automated systems.
Applications
- Production
- R&D
- Special applications
- For g-line, i-line, DUV
- Substrates: silicon, compound semi (GaAs, others), glass
- Substrate shapes: round, square, rectangle
Benefits
- Precise, repeatable results
- Low cost of ownership; low maintenance
- Intuitive programming and operation
- Quick & easy substrate size conversion
Features
- Compact footprint (19"x 42" typical) (19"x 60" combo)
- Configurations for 2" to 300 mm wafers, squares or pieces
- Automated wafer transfer & centering
- Combined coat & develop system configuration for cost-savings
- Intuitive Windows-XP-based GUI
- Programmable dispense arm
- Interfaces available for most chemical pumps
- Pop-up Help screens for assistance
- Large capacity for program storage (hard drive)
- Back up program retention (flash drive)
- Advanced mechanical positioning and control systems
The SpinBall tool retains many Tractrix-style key features such as the advanced spin module, hot plate, and Windows®-based easy-to-use control software. It's all packaged in an economical, manually loaded, single-wafer system.
The SpinBall tool is flexible. It can contain just a spin module with all wafer load/unload and dispenses performed manually by the operator. Also, it can be configured to automatically dispense, spin, bake and chill completely under program control. You decide.