SpinBall™ Single-wafer Spin Station

Product Summary: 
SpinBall, small footprint, semi-automated track systems with manual load & unload

The SpinBall Spin Station is a small, manually loaded tool designed for the spin deposition of photoresists, developers, polymers and other materials common to integrated circuit photolithography. Built using the same proven technology of our production-grade Tractrix™ spin track, the SpinBall tool contains many of the same advanced components and automatic capabilities and is a low-cost alternative to automated systems.

Applications: 
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Production
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R&D
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Special applications
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For g-line, i-line, DUV
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Substrates: silicon, compound semi (GaAs, others), glass
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Substrate shapes: round, square, rectangle
Benefits: 
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Precise, repeatable results
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Low cost of ownership; low maintenance
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Intuitive programming and operation
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Quick & easy substrate size conversion
Features: 
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Compact footprint (19"x 42" typical) (19"x 60" combo)
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Configurations for 2" to 300 mm wafers, squares or pieces
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Automated wafer transfer & centering
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Combined coat & develop system configuration for cost-savings
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Intuitive Windows-XP-based GUI
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Programmable dispense arm
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Interfaces available for most chemical pumps
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Pop-up Help screens for assistance
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Large capacity for program storage (hard drive)
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Back up program retention (flash drive)
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Advanced mechanical positioning and control systems
Product Outro: 

The SpinBall tool retains many Tractrix-style key features such as the advanced spin module, hot plate, and Windows®-based easy-to-use control software. It's all packaged in an economical, manually loaded, single-wafer system.

The SpinBall tool is flexible. It can contain just a spin module with all wafer load/unload and dispenses performed manually by the operator. Also, it can be configured to automatically dispense, spin, bake and chill completely under program control. You decide.

Position: 
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